CIC Introduces New, Improved CMP Application

In response to feedback from applicants, the Convention Industry Council's (CIC) board of directors has approved a new streamlined application for its Certified Meeting Professional (CMP) program, it announced yesterday.

Taking effect Jan. 1, 2010, the updated application has been modified to ensure relevancy to a wider audience of global meeting professionals while still retaining the CMP credential's high standards.

"The new application will address some of the difficulties experienced by international applicants with the application process," CIC Chief Operating Officer Karen Kotowski, CAE, CMP, said in a statement. "Some of the industry involvement requirements were a uniquely North American experience, and international professionals often acquire much of their knowledge and experience from formal internships. These changes level the playing field for everyone."

In order to apply for the CMP exam, applicants still must have three years of work experience in the meetings industry, although candidates with a degree in meeting, event, exhibition and hospitality/tourism management only have to have two. Applicants also must still complete 25 hours of continuing education, although they can now complete an approved industry internship, instead. Once deemed eligible for the CMP exam, applicants have two years to take and pass it.

"The CMP Board is thrilled with the results of application revision," said CMP Board Chair Kimberly Miles, CMP, senior vice president of industry relations for the American Hotel & Lodging Association. "We believe that the application should be an objective measure of relevant qualifications of a potential CMP, which then hopefully will lead to a successful outcome on the exam. The new application is straightforward and easier to complete."

As a follow-up to the revised CMP application, CIC's CMP Recertification Committee now plans to review and update the CMP recertification application, which applicants use to maintain their CMP designation. The revised application will be available early next year.